advanced lithography
Argonne National Labs have developed a new technique, molecular layer etching, that may help develop microelectronics and show the way beyond Moores Law. Molecular layer etching could enable fabricating and controlling material geometries at the nanoscale, which could open new …
EUV Lithography is enabling another reduction in chip dimensions by 5 to 10 times in line geometry and this will extend Moore’s law and improve processing speed, component density and reduce energy used. ASML is a world leader in lithography …
TSMC (Taiwan Semiconductor) announced that its seven-nanometer plus (N7+), the industrys first commercially available Extreme Ultraviolet (EUV) lithography technology, is delivering customer products to market in high volume. The N7+ process with EUV technology is built on TSMCs successful 7nm …
Researchers demonstrated thermal lithography. They used a probe heated above 100 degrees Celsius to outperform standard methods for making metal electrodes on 2D semiconductors such as molybdenum disulfide (MoS2). Such transitional metals are among the materials that scientists believe may …
Engineers see many options to create 5-, 3- and even 2-nanometer semiconductor process technologies but they will have trouble getting performance improvements as things are made smaller. They are looking at trying to getting the last 10-40% of improvements in …
Intel remains confident about scaling CMOS and extending Moore’s law beyond 2024 Someday we may reach a physical limit. But Intel does not see that point on their horizon. 1990, when the features on the wafer were the same size …